[1]
Новосядлий, С.П., Кіндрат, Т.П., Мельник, Л.В. and Варварук, В.М. 2013. Physical and technological features of formation of metallization of submicron arsenide-gallium structures in large-scale integrated circuits by ion milling. Eastern-European Journal of Enterprise Technologies. 4, 5(64) (Jul. 2013), 3–6. DOI:https://doi.org/10.15587/1729-4061.2013.16660.