Новосядлий, С.П., Мельник, Л.В. and Новосядлий, С.В. 2015. Implementation plasma chemical etching in submicron technology wsi structure. Eastern-European Journal of Enterprise Technologies. 3, 5(75) (Jun. 2015), 21–24. DOI:https://doi.org/10.15587/1729-4061.2015.42128.