СТОЛБОВОЙ, В. А. About effect of the potential and the gas pressure in the vacuum chamber on the intensity of the substrate surface ion sputtering titanium and zirconium. Eastern-European Journal of Enterprise Technologies, [S. l.], v. 2, n. 5(38), p. 18–21, 2009. DOI: 10.15587/1729-4061.2009.5964. Disponível em: https://journals.uran.ua/eejet/article/view/5964. Acesso em: 29 jul. 2024.