Новосядлий, С. П., Л. В. Мельник, and С. В. Новосядлий. “Implementation Plasma Chemical Etching in Submicron Technology Wsi Structure”. Eastern-European Journal of Enterprise Technologies, vol. 3, no. 5(75), June 2015, pp. 21-24, doi:10.15587/1729-4061.2015.42128.