ANALYSIS АND CLASSIFICATION OF METROLOGICAL SUPPORT OF MEASUREMENTS OF NANOOBJECTS RELIEF
Методы исследования наноструктур
DOI:
https://doi.org/10.24025/2306-4412.1.2021.228157Keywords:
nanotechnology, nanomeasurement, metrological support, methods and means of measurement, nanomaterialsAbstract
The article analyzes the existing methods and means of measuring objects in the nanometer range and develops their classification based on the main principles of use. The main parameters on which each described method is based are considered and the conditions for their most effective application
are determined. It is proved that chemical and electrical sets of properties of the nanomaterial can change when the particle size decreases to the nanometer size, which requires the inclusion of additional chemical and electrical tests in existing methods. Based on the analysis, it has been
determined that the method of scanning probe microscopy is the most functional and universal in solving a wide range of problems. The classification of existing methods of scanning probe microscopy
based on the nature of their applications is developed. The main directions of creation and use of methods of measurement of micro- and nanosystems are determined, namely: creation of model representations of connections of topological characteristics and reaction of object to external influences, establishment of communications between properties of an element or system, research of structure, charges and fields, establishing links between technological factors, the kinetics of formation and the properties of nanostructures, creation of models that link functional parameters of devices with the properties of structures. It is proved that in order to obtain more reliable results, the method of nanomeasurements should take into account the effects of external destabilizing factors on the nanoobject and ensure the possibility of correcting the deviations caused by them. To simplify the process of choosing nanomeasurement methods, a method for detecting deviations due to the influence of external destabilizing factors has been developed. Universal expressions for the description of a stream of the revealed deviations of nanoobjects of various configuration are received. It is recommended to use techniques based on the principle of integration of information provided by different methods to increase the accuracy of nano-measurements. It is proved that increasing the number of measurement methods used in the metrological analysis of nanoobjects will increase the reliability and accuracy of measurement results and each method will provide additional information.
References
E. M. Bromberg, and K. L. Kulikovsky, Test methods for improving measurement accuracy. Moscow: Energiya‚ 2008. [in Russian].
S. A. Kononogov, "Investigation of measuring and calibration capabilities of measuring instruments of the nanometer range", Zakonodatelnaya i prikladnaya metrologiya, no. 3, pp. 19-25, 2008. [in Russian].
P. A. Todua, "Metrology and standardization in nanotechnology and nanoindustry", Izmeritelnaya tekhnika, no. 5, pp. 5-7, 2008. [in Russian].
The Scanning Probe Image Processor (SPIP) [Online]. Available: www.imagemet.com.
L. Garnaes, "Two-dimensional nanometer scale calibration based on one-dimensional gratings", Appl. Phys., A 66, pp. 831-835, 1998.
Nanosurf. "Atomic force microscopy applications". [Online]. Available://www.nanosurf.com/en/.
"Equipment for real-time industrial appli-cations". [Online]. Available:http://www.digital-instruments.com/.
W. Fritzsche, L. Takac, and E. Henderson, "Application of atomic force microscopy to visualization of DNA, chromatin, and chromosomes", Critical Reviews in Eukaryotic Gene Expression, vol. 7, pp. 231-240, 1997.
S. Roth, L. Dellmann, G. A. Racine, and N. F. de Rooij, "High aspect ratio UV photolithography for electroplated structures", J. Micromech. Mecroeng., vol. 9, pp. 105-108, 1999.
AZOnano. [Online]. Available: //www.azonano.com/.
R. A. Said, "Microfabrication by localized electrochemical deposition: experimental investigation and theoretical modeling", Nanotechnology, vol. 15, p. 867, 2004.
H. Iwasaki, T. Yoshinobu, and K. Sudoh, "Nanolithography on SiO2/Si with a scanning tunneling microscope", Nanotechnology, vol. 14, pp. 55-62, 2003.
A. Majumdar, P. I. Oden, J. P. Carrejo, L. A. Nagahara, J. J. Graham, and J. Alexander, "Nanometer-scale lithography using the atomic force microscope", Appl. Phys. Letters, vol. 61, pp. 2293-2295, 1992.
C. K. Hyon et al., "Application of atomicforce-microscope direct patterning to selective positioning of InAs quantum dots on GaAs", Appl. Phys. Letters, vol. 77, pp. 2607-2609, 2000.
M. Falvo et al., "The nanomanipulator:A teleoperator for manipulating materials at the nanomerter scale", in Proc. Int. Symp. On Science and Technology of Atomically Engineered Materials, 1996, pp. 579-586.
M. Sitti, and H. Hashimoto, "Tele-nanorobotics using atomic force microscope as a robot and sensor", Advanced Robotics Journal, vol. 13, no. 4, pp. 417-436, 1999.
M. Sitti, and H. Hashimoto, "Two-dimensional fine particle positioning under optical microscope using a piezoresistive cantilever as a manipulator", Journal of Micromechatronics, vol. 1, no. 1, pp. 25-48, 2000.
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