THE INFLUENCE OF THE MAIN OPERATING PARAMETERS OF THE RIBBON-SHAPED FLOW OF ELECTRONS ON THE QUALITY OF THE OBTAINED MICRORELIEF ON THE OPTICAL GLASS SURFACE
DOI:
https://doi.org/10.24025/2306-4412.3.2022.266662Keywords:
стрічковий потік електронів, визначення робочих параметрівAbstract
The article presents the results of the study of the influence of the main operating parameters of the ribbon-shaped flow of electrons on the quality of the microrelief on the optical glass surface. The purpose of the work is to determine the influence of the main operating parameters of the ribbonshaped flow of electrons (shape, size and distribution of the electron current density) on the quality of the optical glass surface (absence of micro- and macro-defects on the surface, minimal residual micro-uniformities, etc.). The dependence of the influence of the main operating parameters of the low-energy ribbon-shaped flow of electrons on the quality of the surface microrelief of the "crown" optical glass is established, which makes it possible to evaluate the process of interaction of the electron flow with the optical glass surface. It is also established that the useful current of the electron flow is about 30% of the total emission current of the cathode of the electron gun. It is shown that such factors as: the decrease in the diameter of probes under the influence of the electron flow and the heating of probes during the measurement can affect the accuracy of determining the operating parameters of the ribbon-shaped electron flow by the probing method. Thus, after approximately 40-50 measurements, a significant decrease in the diameter of probes to 5% occurs, after which it becomes necessary to install new probes with identical characteristics. At the same time, the total error of the probe method for determining the density of the electron flow doesn’t exceed 8%. Using the method of atomicforce microscopy, it is established that after processing the surfaces of optical glass of the "crown" grade with a low-energy ribbon-shaped electron flow, provided that the rational shape, size and distribution of the current density are ensured both in the operating space and on the treated surface, their regularities are reduced from 40-75 nm to 3,5-5 nm. The practical value of the work lies in the production of various devices and complexes (as focusing photo-receiving and reflecting components) using the proposed technology. In general, the glass surface after electron beam treatment has a more uniform structure and is protected from microdefects, unlike surfaces without electron beam treatment, which finds application.
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