Mechanical processing of sapphire crystals and producing substrates of them
DOI:
https://doi.org/10.24144/2415-8038.2000.7.161-173Keywords:
Sapphire, Gallium nitride (GaN), HeteroepitaxyAbstract
The main stages of the producing technology of sapphire plates of (0001) orientation with the basic plane (112̅0) for GaN heteroepitaxy are described.
References
Папков В.С., Цыбульников М.Б Эпитаксиальные кремневые слои на диэлектрических подложках и приборы на их основе - М: Энергия. 1979. 88с.
Ponce F.A., Bour DP. Nitride-based semiconductors for blue and green light-emitting devices. -Nature. 1997. V.386. P.351-359.
Мокеев О.К., Романов А С. Технология полупроводникового производства. - М.: Высш. школа. 1984.
Блецкан Д.І., Блецкан О.Д., Лук'янчук О.Р., Машков A.I., Пекар Я.М., Цифра В.І. Промислове вирощування моно-кристалів сапфіра видозміненим методом Кіропулоса. - Науковий вісник Ужгородського університету. Серія фізика. 2000. №6. С.221-240.
Рубин и сапфир. Под ред. Классен-Неклюдовой М.В., Багдасарова X С. -М.: Наука. 1974. 236 с.
Шубников А.В. Оптическая кристаллография. М.: Изд-во АН СССР. 1950. 275 с.
Грум-Гржимайло С.В. Приборы и методы для оптического исследования кристаллов. - М.: Наука. 1972. 127 с.
Downloads
Published
Issue
Section
License
Copyright (c) 2000 Scientific Herald of Uzhhorod University.Series Physics

This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
Authors who publish with this journal agree to the following terms:- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgement of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See The Effect of Open Access).