n<sup>+</sup> - n - InSe - n<sup>+</sup> photo transistor on the base of a symmetric heterojunction

Authors

  • О. М. Сидор Chemivtsi Department of Institute for Problems of Materials Science, Ukraine

DOI:

https://doi.org/10.24144/2415-8038.2005.17.95-98

Abstract

A possibility of fabrication of an oxide-InSe-oxide double symmetric heterojunction all the components of which have n-tуре conductivity is shown. The phototransistor effect is found to be observed in a wide range of base thickness: from 7 up to 110 m.A considerable photocurrent amplification is realized only for the base sample thickness comparable to the minority carrier diffusion length. A specific feature of the amplification is that the transition of phototransistor from the high-resistance state to the low-resistance one takes place at fixed voltages and levels of illumination. In the switching mode a significant current density of about 200 mA/cm2 is attained The higher is illumination level the lower becomes the transition voltage. Photosensitivity of the structures in the wavelength range of 0.6-1.0 m is shown.

References

В.Н.Катеринчук, З.Д.Ковалюк, О.Н.Сидор, ТКЭА 55, 38 (2005).

P.Gomes da Costa, R.G.Dandrea, R.F.Wallis et al„ Phys. Rev. В 48, 14135 (1993).

P.V.Galiy, T.M.Nenchuk, J.M.Stakhira, J. Phys. D, 34, 18(2001).

Landolt-Bomstein, Numerical Data and Functional Relationships in Science and Technology. New Ser. Group 111: Crystal and Solid State Physics, Vol. 17, subvol.f, Ed. by O.Madelung (Springer, Berlin, 1983), p 562.

Published

2005-06-30

Issue

Section

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