Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods

Authors

  • Наталья Афанасьевна Василенко Institute of Chemical Technology East Ukrainian National University named after Volodymyr Dahl Luhansk region., Rubezhnoye str. Lenina 31, com. 408, Ukraine https://orcid.org/0000-0002-5897-6917
  • Алексей Олегович Василенко Donetsk National University Donetsk, Avenue Theater, 13, Ukraine https://orcid.org/0000-0003-2506-5719

Keywords:

ion implantation, condensation and ion bombardment, nitride, physicochemical properties

Abstract


Improvement of physical, mechanical and chemical properties of thin nitride films depends on the methods of their deposition and improvement of the structure, which determines the obtained properties. In the production of nitride films, which are promising in solid-state microelectronics and instrument engineering, various reactive sputtering methods are widely used. For the solution of these problems, relatively new methods - ion implantation method (II) and condensation and ion bombardment (CIB) method, carried out on the "Bulat" in stallation are quite promising. However, films, obtained by various methods using the same initial materials, as a rule, have various characteristics. In this paper, the films of nitrides on Ti, Ta, W, Mo, Ni, Si (111) and NaCl (100) substrates were obtained by the above methods, their physical, electrical and chemical characteristics were studied. The kinetics and mechanism of build-up of the obtained film coatings were established, the growth constant was calculated. Due to the study of physicochemical properties of films, obtained by various methods it is possible to obtain film coatings with previously predicted properties.

Author Biographies

Наталья Афанасьевна Василенко, Institute of Chemical Technology East Ukrainian National University named after Volodymyr Dahl Luhansk region., Rubezhnoye str. Lenina 31, com. 408

Candidate of Physical and Mathematical Sciences, Assoc.

Chair Department of Physics and Technical Mechanics

Алексей Олегович Василенко, Donetsk National University Donetsk, Avenue Theater, 13

Student 2nd year c. F-2

Department "Nanophysics", Faculty of Physics and tehnichesky

References

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Published

2014-01-10

Issue

Vol. 16 No. 5 (2013)

Section

Material Science in mechanical engineering

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Copyright (c) 2015 Наталья Афанасьевна Василенко, Алексей Олегович Василенко

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