Texturizing of polycrystal and multicrystal silicon materials surface
DOI:
https://doi.org/10.15587/1729-4061.2012.3426Keywords:
Multicrystal silicon, light reflectance, surface texturizationAbstract
The general tendences of the interaction process between the surface of multicrystal silicon and texturizing acid solutions are defined. Optimal processing conditions and corresponded compositions of the system are developed on their basisReferences
- J.D. Hylton Alkaline etching for reflectance reduction in multycrystalline silicon solar cells /J.D. Hylton, A.R. Burgers, W.C. Sinke// Journal of electrochemical society. – 2004. – vol. 151. – P. 408 – 427.
- L.A. Dobrzanski Surface texturing of multycrystalline silicon solar cells / L.A. Dobrzanski, A. Drygala // Journal of Achievements in Materials and Manufacturing Engineering. – 2008. – vol. 31, Is. 2. – P. 77 – 82.
- J. Kim Surface reflectance reduction of multicrystalline silicon wafers for solar cells by acid texturing / J.Kim, B. Kim, S. Lee // Journal of the Korean institute of electrical and electronic materials engineers. – 2008. – vol. 21, No 2. – P. 99 – 103.
- M. Banchman Isotropic silicon etch using HNA / M. Banchman // INRF application note. – 2000. – 4 p.
- S.W. Park Application of acid texturing to multi-crystalline silicon wafers / S.W. Park, J. Kim, S.H. Lee // J. Kor. Phys. Soc. – 2002. – vol. 30, No. 1. – P. 423 – 426.
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