Ellipsometry in submicronic technology of formation of GIC structures
DOI:
https://doi.org/10.15587/1729-4061.2010.2856Keywords:
ellipsometry, silicon, submicron technology, testing methods, lithographyAbstract
Describes a physical and mathematical principles of ellipsometry, nature of its use to determine the optical constants, monitoring and study the properties and processes for functional layers in the formation of submicron structures of large integrated circuits.References
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