N-CHANNEL D-MOS TRANSISTOR WITH DOUBLE-DIFFUSION OF THE DECIMETER RANGE FREQUENCIES
DOI:
https://doi.org/10.15587/1729-4061.2010.3148Keywords:
transistor, topology, autodyne sensorAbstract
The MOS field effect transistor with vertical structure is designed by a method of double diffusion. The transistor is calculated on work in a range of frequencies up to 900 MHz. Formation of a gate and a source metallization is spent in one technological cycle that simplifies technological process of manufacturing of the transistor and lowers requirements to tolerances of this fabrication stage.References
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