About effect of the potential and the gas pressure in the vacuum chamber on the intensity of the substrate surface ion sputtering titanium and zirconium

Authors

  • Вячеслав Александрович Столбовой Национальный научный центр «Харьковский физико-технический институт» Ул. Академическая, 1, г. Харьков, 61108, Ukraine

DOI:

https://doi.org/10.15587/1729-4061.2009.5964

Abstract

The problems associated with cleaning the surface of the substrate by ion bombardment of titanium and zirconium by vacuum-arc method are considered. It is shown that the clean substrates before application of vacuum-arc coatings must be performed in a high vacuum (pressure of not more than 0.004 Pa) at a negative potential of at least 900 V

Author Biography

Вячеслав Александрович Столбовой, Национальный научный центр «Харьковский физико-технический институт» Ул. Академическая, 1, г. Харьков, 61108

Инженер-исследователь

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Published

2009-04-01

How to Cite

Столбовой, В. А. (2009). About effect of the potential and the gas pressure in the vacuum chamber on the intensity of the substrate surface ion sputtering titanium and zirconium. Eastern-European Journal of Enterprise Technologies, 2(5(38), 18–21. https://doi.org/10.15587/1729-4061.2009.5964

Issue

Vol. 2 No. 5(38) (2009): Applied physics and materials science

Section

Applied physics

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Copyright (c) 2014 Вячеслав Александрович Столбовой

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